DocumentCode :
46281
Title :
Physical Analysis and Design of Resonant Plasma-Wave Transistors for Terahertz Emitters
Author :
Jong Yul Park ; Sung-Ho Kim ; Sung-Min Hong ; Kyung Rok Kim
Author_Institution :
Sch. of Electr. & Comput. Eng., Ulsan Nat. Inst. of Sci. & Technol., Ulsan, South Korea
Volume :
5
Issue :
2
fYear :
2015
fDate :
Mar-15
Firstpage :
244
Lastpage :
250
Abstract :
In this work, we performed physical analysis of resonant plasma-wave transistors (PWTs) for terahertz (THz) emitters. Through the analytical decomposition of plasma-waves into upstream and downstream focusing on the different phase velocity, we show that the reflection coefficient is over unity and newly introduce the PWT design window based on a simple 2-D plot, which can provide both the maximum channel length (Lmax) and operation frequency. By our design window analysis, strained silicon channel with a momentum relaxation time of 50-160 fs (i.e., channel mobility 500-1500 cm2/Vs) show technology-compatible Lmax as 12-40 nm with a tunable resonance frequency of 2- 10 THz .
Keywords :
elemental semiconductors; field effect transistors; plasma focus; plasma waves; reflectivity; silicon; terahertz wave devices; 2D plot; Si; analytical decomposition; design window analysis; downstream focusing; frequency 2 THz to 10 THz; maximum channel length; momentum relaxation time; operation frequency; phase velocity; physical analysis; reflection coefficient; resonant plasma-wave transistors; size 12 nm to 40 nm; strained silicon channel; terahertz emitters; time 50 fs to 160 fs; tunable resonance frequency; upstream focusing; HEMTs; Logic gates; MODFETs; Oscillators; Resonant frequency; Silicon; Plasma-wave transistor (PWT); design window; emitter; maximum channel length; mobility; momentum relaxation time; resonance frequency; strained silicon; terahertz (THz);
fLanguage :
English
Journal_Title :
Terahertz Science and Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-342X
Type :
jour
DOI :
10.1109/TTHZ.2015.2392630
Filename :
7029115
Link To Document :
بازگشت