• DocumentCode
    465308
  • Title

    Concurrent Wire Spreading, Widening, and Filling

  • Author

    Rizzo, Olivier ; Melzner, Hanno

  • Author_Institution
    Infineon Technol. France, Sophia Antipolis
  • fYear
    2007
  • fDate
    4-8 June 2007
  • Firstpage
    350
  • Lastpage
    353
  • Abstract
    Automated design tools produce layouts complying with all design rules (DRs). However, most wires are designed with minimum width, making them susceptible to random defect induced interruptions (opens). Spaces between wires are also often designed at minimum size, causing yield loss from random defect induced connections (shorts). SFF ("Spread - Fatten - Fill") is a methodology to improve layout - specifically for routing metal layers - in terms of yield loss related to opens and shorts. Additionally, a novel fill concept improves metal density uniformity. In this paper, we will explain issues that were observed and addressed in the implementation on a real layout, and present results achieved in the first experiment on silicon.
  • Keywords
    concurrent engineering; wires; automated design tools; concurrent wire spreading; metal density uniformity; random defect; random defect induced interruptions; routing metal layers; wire filling; wire widening; yield loss; Algorithm design and analysis; Filling; Integrated circuit synthesis; Manufacturing; Permission; Routing; Silicon; Space technology; Switches; Wire; Algorithms; Defect Limited Yield; Design; Experimentation; Filling; Manufacturing; Performance; Wire Spreading; Wire Widening;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
  • Conference_Location
    San Diego, CA
  • ISSN
    0738-100X
  • Print_ISBN
    978-1-59593-627-1
  • Type

    conf

  • Filename
    4261204