DocumentCode
465308
Title
Concurrent Wire Spreading, Widening, and Filling
Author
Rizzo, Olivier ; Melzner, Hanno
Author_Institution
Infineon Technol. France, Sophia Antipolis
fYear
2007
fDate
4-8 June 2007
Firstpage
350
Lastpage
353
Abstract
Automated design tools produce layouts complying with all design rules (DRs). However, most wires are designed with minimum width, making them susceptible to random defect induced interruptions (opens). Spaces between wires are also often designed at minimum size, causing yield loss from random defect induced connections (shorts). SFF ("Spread - Fatten - Fill") is a methodology to improve layout - specifically for routing metal layers - in terms of yield loss related to opens and shorts. Additionally, a novel fill concept improves metal density uniformity. In this paper, we will explain issues that were observed and addressed in the implementation on a real layout, and present results achieved in the first experiment on silicon.
Keywords
concurrent engineering; wires; automated design tools; concurrent wire spreading; metal density uniformity; random defect; random defect induced interruptions; routing metal layers; wire filling; wire widening; yield loss; Algorithm design and analysis; Filling; Integrated circuit synthesis; Manufacturing; Permission; Routing; Silicon; Space technology; Switches; Wire; Algorithms; Defect Limited Yield; Design; Experimentation; Filling; Manufacturing; Performance; Wire Spreading; Wire Widening;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location
San Diego, CA
ISSN
0738-100X
Print_ISBN
978-1-59593-627-1
Type
conf
Filename
4261204
Link To Document