DocumentCode :
465338
Title :
Statistical Framework for Technology-Model-Product Co-Design and Convergence
Author :
Cho, Choongyeun ; Kim, Daeik ; Kim, Jonghae ; Plouchart, Jean-Olivier ; Trzcinski, Robert
Author_Institution :
IBM, Hopewell Junction
fYear :
2007
fDate :
4-8 June 2007
Firstpage :
503
Lastpage :
508
Abstract :
This paper presents a statistical framework to cooperatively design and develop technology, product circuit, benchmarking and model early in the development stage. The statistical data- driven approach identifies device characteristics that are most correlated with a product performance, and estimates performance yield. A statistical method that isolates systematic process variations on die-to-die and wafer-to-wafer levels is also presented. The proposed framework enables translations of interactions among technology, product, and model, and facilitates collaborative efforts accordingly. The proposed methodology has been applied to first three development generations of 65 nm technology node and microprocessor product current-controlled oscillators (ICOs) for phase-locked loops (PLLs) that were migrated from 90 nm. Automated manufacturing floor in-line characterization and bench RF measurements are used for the methodology. The ICO exhibits yield improvement of RF oscillation frequency from 47% to 99% across three different 65 nm SOI technology generations.
Keywords :
microprocessor chips; radiofrequency oscillators; silicon-on-insulator; statistical analysis; wafer level packaging; RF oscillation frequency; SOI technology generations; automated manufacturing floor; bench RF measurements; development generations; die-to-die levels; microprocessor product current-controlled oscillators; phase-locked loops; statistical data-driven approach; statistical framework; statistical method; systematic process variations; technology-model-product co-design; wafer-to-wafer levels; Circuits; Collaboration; Isolation technology; Microprocessors; Oscillators; Phase locked loops; Radio frequency; Semiconductor device modeling; Statistical analysis; Yield estimation; Design; Design for Yield (DFY); Economics; Measurement; Performance; Process Variation; Statistical; Technology-Model-Product Co-design; Verification; Yield;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location :
San Diego, CA
ISSN :
0738-100X
Print_ISBN :
978-1-59593-627-1
Type :
conf
Filename :
4261236
Link To Document :
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