DocumentCode
465338
Title
Statistical Framework for Technology-Model-Product Co-Design and Convergence
Author
Cho, Choongyeun ; Kim, Daeik ; Kim, Jonghae ; Plouchart, Jean-Olivier ; Trzcinski, Robert
Author_Institution
IBM, Hopewell Junction
fYear
2007
fDate
4-8 June 2007
Firstpage
503
Lastpage
508
Abstract
This paper presents a statistical framework to cooperatively design and develop technology, product circuit, benchmarking and model early in the development stage. The statistical data- driven approach identifies device characteristics that are most correlated with a product performance, and estimates performance yield. A statistical method that isolates systematic process variations on die-to-die and wafer-to-wafer levels is also presented. The proposed framework enables translations of interactions among technology, product, and model, and facilitates collaborative efforts accordingly. The proposed methodology has been applied to first three development generations of 65 nm technology node and microprocessor product current-controlled oscillators (ICOs) for phase-locked loops (PLLs) that were migrated from 90 nm. Automated manufacturing floor in-line characterization and bench RF measurements are used for the methodology. The ICO exhibits yield improvement of RF oscillation frequency from 47% to 99% across three different 65 nm SOI technology generations.
Keywords
microprocessor chips; radiofrequency oscillators; silicon-on-insulator; statistical analysis; wafer level packaging; RF oscillation frequency; SOI technology generations; automated manufacturing floor; bench RF measurements; development generations; die-to-die levels; microprocessor product current-controlled oscillators; phase-locked loops; statistical data-driven approach; statistical framework; statistical method; systematic process variations; technology-model-product co-design; wafer-to-wafer levels; Circuits; Collaboration; Isolation technology; Microprocessors; Oscillators; Phase locked loops; Radio frequency; Semiconductor device modeling; Statistical analysis; Yield estimation; Design; Design for Yield (DFY); Economics; Measurement; Performance; Process Variation; Statistical; Technology-Model-Product Co-design; Verification; Yield;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location
San Diego, CA
ISSN
0738-100X
Print_ISBN
978-1-59593-627-1
Type
conf
Filename
4261236
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