DocumentCode :
46546
Title :
Effects of Standard Free Energy on NiO Bipolar Resistive Switching Devices
Author :
Guokun Ma ; Xiaoli Tang ; Hua Su ; Yuanxun Li ; Huaiwu Zhang ; Zhiyong Zhong
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Chengdu, China
Volume :
61
Issue :
5
fYear :
2014
fDate :
May-14
Firstpage :
1237
Lastpage :
1240
Abstract :
Metal/NiO/Pt films with various electrodes were fabricated to investigate the effects of standard free energy (SFE) on NiO resistive switching devices. By selecting Ti, Ta, Ag, Cu, and Co as the top electrodes (TEs), we found that the switching voltage was inversely proportional to the SFE. The reason for this is attributed to the different thicknesses of the oxidized interface between TE and NiO. Since the thickness of the oxidized interface depends on the SFE, this paper provides an effective way to control and adjust the switching voltage.
Keywords :
cobalt; copper; electrodes; magnetic thin films; nickel compounds; platinum; random-access storage; silver; tantalum; titanium; Ag; Co; Cu; NiO-Pt; Ta; Ti; bipolar resistive switching devices; oxidized interface; standard free energy; top electrodes; Educational institutions; Electrodes; Electron devices; Materials; Metals; Switches; Voltage measurement; NiO; resistive random access memory (RRAM); resistive switching; the standard free energy; the standard free energy.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2309975
Filename :
6777282
Link To Document :
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