DocumentCode
466623
Title
Simulation of quasi-stationary and transient effects in gan based heterostructure field effect transistors
Author
Braga, N. ; Mickevicius, R. ; Rao, V. ; Fichtner, W.
Author_Institution
Synopsys Inc., Mountain View
fYear
2006
fDate
25-28 June 2006
Firstpage
51
Lastpage
56
Abstract
Numerical simulations to compute stress distributions resulting from stressed overlayers reveal that significant stress fields can penetrate deep into device. Piezoelectric polarization effects from stressed overlayers are only mild due to relatively high stiffness in nitrides but can change band profile along the channel, especially under gate edges. Fringing fields in passivation layers with large dielectric constants can play important role in collapse reduction.
Keywords
III-V semiconductors; gallium compounds; high electron mobility transistors; passivation; permittivity; piezoelectricity; wide band gap semiconductors; GaN based heterostructure field effect transistors; band profile; dielectric constants; fringing fields; passivation layers; piezoelectric polarization effects; quasistationary effects; stress distributions; transient effects; Computational modeling; Dielectric constant; Distributed computing; Gallium nitride; HEMTs; MODFETs; Numerical simulation; Passivation; Piezoelectric polarization; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
University/Government/Industry Microelectronics Symposium, 2006 16th Biennial
Conference_Location
San Jose, CA
ISSN
0749-6877
Print_ISBN
1-4244-0267-0
Type
conf
DOI
10.1109/UGIM.2006.4286352
Filename
4286352
Link To Document