• DocumentCode
    466623
  • Title

    Simulation of quasi-stationary and transient effects in gan based heterostructure field effect transistors

  • Author

    Braga, N. ; Mickevicius, R. ; Rao, V. ; Fichtner, W.

  • Author_Institution
    Synopsys Inc., Mountain View
  • fYear
    2006
  • fDate
    25-28 June 2006
  • Firstpage
    51
  • Lastpage
    56
  • Abstract
    Numerical simulations to compute stress distributions resulting from stressed overlayers reveal that significant stress fields can penetrate deep into device. Piezoelectric polarization effects from stressed overlayers are only mild due to relatively high stiffness in nitrides but can change band profile along the channel, especially under gate edges. Fringing fields in passivation layers with large dielectric constants can play important role in collapse reduction.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; passivation; permittivity; piezoelectricity; wide band gap semiconductors; GaN based heterostructure field effect transistors; band profile; dielectric constants; fringing fields; passivation layers; piezoelectric polarization effects; quasistationary effects; stress distributions; transient effects; Computational modeling; Dielectric constant; Distributed computing; Gallium nitride; HEMTs; MODFETs; Numerical simulation; Passivation; Piezoelectric polarization; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Microelectronics Symposium, 2006 16th Biennial
  • Conference_Location
    San Jose, CA
  • ISSN
    0749-6877
  • Print_ISBN
    1-4244-0267-0
  • Type

    conf

  • DOI
    10.1109/UGIM.2006.4286352
  • Filename
    4286352