• DocumentCode
    471529
  • Title

    Effects on Normal Gait of a New Active Knee Orthosis for Hemiparetic Gait Retraining

  • Author

    Patel, Shyamal ; Patritti, Benjamin L. ; Nikitczuk, Jason ; Weinberg, Brian ; Croce, Ugo Della ; Mavroidis, Constantinos ; Bonato, Paolo

  • Author_Institution
    Dept. of Phys. Medicine & Rehabilitation, Harvard Med. Sch., Boston, MA
  • fYear
    2006
  • fDate
    Aug. 30 2006-Sept. 3 2006
  • Firstpage
    1232
  • Lastpage
    1235
  • Abstract
    Functional recovery of an impaired gait pattern is a common goal for stroke patients in their rehabilitation. Robotic and mechatronic devices offer a means of facilitating and enhancing gait retraining practices undertaken by clinicians. A new active knee orthosis has been developed for gait retraining of stroke patients that may fulfil this role. Since this device is newly developed, it is important to determine its impact on the walking patterns of healthy individuals before exploring its use in gait retraining of stroke patients. The aim of this study was to analyze adaptations in gait mechanics of healthy subjects due to the added mass of the knee orthosis while worn uni-laterally and bi-laterally. In our preliminary tests we observed significant deviations from normal gait patterns when the knee orthosis was worn uni-laterally. Conversely, minor gait deviations were seen when the knee orthosis was worn bi-laterally. This suggests that a bilateral configuration may be more suited for gait retraining purposes
  • Keywords
    bone; diseases; gait analysis; orthotics; patient rehabilitation; active knee orthosis; gait mechanics; hemiparetic gait retraining; impaired gait pattern; mechatronic device; rehabilitation; robotic device; stroke patient; walking pattern; Hip; Hospitals; Knee; Leg; Mechatronics; Medical treatment; Motor drives; Orthotics; Rehabilitation robotics; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE
  • Conference_Location
    New York, NY
  • ISSN
    1557-170X
  • Print_ISBN
    1-4244-0032-5
  • Electronic_ISBN
    1557-170X
  • Type

    conf

  • DOI
    10.1109/IEMBS.2006.260310
  • Filename
    4461981