Title :
Analysis of Skin-Electrode Impedance Using Concentric Ring Electrode
Author :
Besio, W. ; Prasad, A.
Author_Institution :
Dept. of Biomed. Eng., Louisiana Tech. Univ., Ruston, LA
fDate :
Aug. 30 2006-Sept. 3 2006
Abstract :
A significant contributor to artefact generation in surface electromyography (sEMG) and, functional electrical stimulation (FES) intensity is the skin-to-electrode impedance (ZSE/). While using electrolytic gels may initially lower ZSE/, the impedance may not remain stable. It can vary over time due to changes in underlying structures such as sweat glands and physical deformations due to movements. An experiment seeking to identify major factors in the reduction of ZSE/, and therefore mitigate these artefacts, was performed by varying a series of control factors on the concentric ring electrode (CRE). Unlike conventional disc electrodes, CREs have small surface areas which may exacerbate ZSE/ changes. The factors tested were electrode material, electrode size, skin preparation, and surface pressure. This work analyzes how these factors in their various combinations effect changes in ZSE/ and suggests protocols for improving recording or stimulation with CREs via lowered and consistent ZSE/
Keywords :
biomedical electrodes; deformation; electrolytes; electromyography; gels; skin; FES; concentric ring electrode; control factors; electrode material; electrode size; electrolytic gels; functional electrical stimulation; physical deformation; skin preparation; skin-electrode impedance; surface EMG; surface electromyography; surface pressure; sweat glands; Biological system modeling; Biomedical electrodes; Computational modeling; Computer interfaces; Humans; Skin; Surface impedance; Surface topography; Testing; USA Councils; Concentric ring electrode (CRE); FES; Functional Electrical stimulation; Surface Electromyography; sEMG; skin-to-electrode impedance;
Conference_Titel :
Engineering in Medicine and Biology Society, 2006. EMBS '06. 28th Annual International Conference of the IEEE
Conference_Location :
New York, NY
Print_ISBN :
1-4244-0032-5
Electronic_ISBN :
1557-170X
DOI :
10.1109/IEMBS.2006.260048