Title :
Thermal and Microwave Nitrogen Plasma Nitridation Techniques for Ultrathin Gate Insulators of MOS VLSI
Author :
Moslehi, M.M. ; Fu, C.Y. ; Saraswat, K.C.
Author_Institution :
Department of Electrical Engineering, Stanford University, Stanford, CA. 94305
Keywords :
Electromagnetic heating; Insulation; Kinetic theory; Microwave theory and techniques; Nitrogen; Plasma applications; Plasma devices; Plasma properties; Plasma temperature; Very large scale integration;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
