DocumentCode :
472634
Title :
1.1K-Gate CMOS/SOI Gate Array by Laser Recrystallization Technique
Author :
Sakashita, K. ; Nishimura, T. ; Kusunoki, S. ; Kuramitsu, Y. ; Akasaka, Y.
Author_Institution :
LSI Research and Development Laboratory Mitsubishi Electric Corporation 4-1 Mizuhara, Itami, 664 Japan
fYear :
1985
fDate :
14-16 May 1985
Firstpage :
32
Lastpage :
33
Keywords :
Grain boundaries; Laboratories; Large scale integration; Optical arrays; Optical device fabrication; Power lasers; Research and development; Ring lasers; Silicon; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
Type :
conf
Filename :
4480289
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472634
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