DocumentCode :
472638
Title :
A New Bipolar Transistor Structure for Very High Speed VLSI
Author :
Kobayashi, Yoshiji ; Yamamoto, Yousuke ; Sakai, Tltsushi
Author_Institution :
Atsugi Electrical Communication Laboratory, NTT 1839, Ono, Atsugi-shi, Kanagawa, Japan, 243-01
fYear :
1985
fDate :
14-16 May 1985
Firstpage :
40
Lastpage :
41
Keywords :
Bipolar transistors; Cutoff frequency; Electrodes; Electrons; Fabrication; Ion implantation; Laboratories; Parasitic capacitance; Propagation delay; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
Type :
conf
Filename :
4480293
Link To Document :
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