Title :
Plararization with Spin-on-Glass/LPCVD Composite Films
Author :
Dupuis, F. ; Oldham, W.G. ; Shacham-Diamand, Yosi
Author_Institution :
Dept. of Electrical Engineering and Computer Sciences and The Electronics Research Laboratory, University of California, Berkeley 94720
Abstract :
A physical and electrical evaluation of the feasibility of planarization by means of composite films has been carried out. The use of even a very thin spin-on film underneath a conventional LP1CVD PSG oxide Film significantly improves the final topography. The electrical properties of the undoped PSG film are consistent with use in CMOS VLSI technologies.
Keywords :
Annealing; Contacts; Dry etching; Electrical capacitance tomography; Laboratories; Silicon; Sputter etching; Surfaces; Very large scale integration; Wet etching;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
