DocumentCode
472659
Title
Reactive Ion Stream Etching and Metallic Compund Deposition Using ECR Plasma Technology
Author
Ono, T. ; Takahashi, C. ; Oda, M. ; Matsuo, S.
Author_Institution
Atsugi Electrical Communication Laboratory, NTT Atsugi-shi, Kanagawa 243-01, Japan
fYear
1985
fDate
14-16 May 1985
Firstpage
84
Lastpage
85
Keywords
Magnetic fields; Magnetic films; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma transport processes; Sputter etching; Sputtering; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location
Kobe, Japan
Print_ISBN
4-930813-09-3
Type
conf
Filename
4480315
Link To Document