DocumentCode :
472681
Title :
A Mo Gate Submicron MOS Process Using Optical Projection Lithography
Author :
Kwasnick, R.F. ; Griffing, B.F. ; Kaminsky, E.B. ; Frank, P.A. ; Kim, N.J.
Author_Institution :
General Electric Company, Corporate Research and Development, Schenectady, NY 12301
fYear :
1986
fDate :
28-30 May 1986
Firstpage :
11
Lastpage :
12
Keywords :
Annealing; Breakdown voltage; Lithography; MOS devices; Optical materials; Particle beam optics; Propagation delay; Research and development; Ring oscillators; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Type :
conf
Filename :
4480345
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472681
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