DocumentCode :
472695
Title :
Two-Dimensional Simulation of Glass Reflow and Silicon Oxidation
Author :
Sutardja, Pantas ; Shacham-Diamand, Yosi ; Oldham, W.G.
Author_Institution :
Electronics Research Laboratory Department of Electrical Engineering and Computer Sciences University of California, Berkeley, CA 94720, USA
fYear :
1986
fDate :
28-30 May 1986
Firstpage :
39
Lastpage :
40
Keywords :
Computational modeling; Equations; Geometry; Glass; Laboratories; Oxidation; Silicon; Stress; Surface tension; Viscosity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Type :
conf
Filename :
4480359
Link To Document :
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