Trench Capacitor Cell with Double Diffused Structure for Megabit Dynamic RAMS

Author

Yoneda, M. ; Satoh, S. ; Ozaki, H. ; Hirayama, M. ; Yamada, M. ; Yamazaki, T.

Author_Institution

LSI Research and Development Laboratory Mitsubishi Electric Corp. 4-1 Mizuhara, Itami, 664, Japan

fYear

1986

fDate

28-30 May 1986

Firstpage

Lastpage

Keywords

Boron; Capacitors; Error analysis; Etching; Flowcharts; Impurities; Large scale integration; Metalworking machines; Random access memory; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1986. Digest of Technical Papers. Symposium on

Conference_Location

San Diego, CA, USA

Type

Filename

4480378

Link To Document