Title :
Trench Capacitor Cell with Double Diffused Structure for Megabit Dynamic RAMS
Author :
Yoneda, M. ; Satoh, S. ; Ozaki, H. ; Hirayama, M. ; Yamada, M. ; Yamazaki, T.
Author_Institution :
LSI Research and Development Laboratory Mitsubishi Electric Corp. 4-1 Mizuhara, Itami, 664, Japan
Keywords :
Boron; Capacitors; Error analysis; Etching; Flowcharts; Impurities; Large scale integration; Metalworking machines; Random access memory; Substrates;
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
