Title :
Advanced Excimer Laser Lithography
Author :
Endo, M. ; Nakagawa, H. ; Hirai, Y. ; Sasago, M. ; Ogawa, K. ; Ishihara, T.
Author_Institution :
Semiconductor Research Center Matsushita Electric Ind. Co., Ltd. Moriguchi-shi, Osaka, 570 Japan
Keywords :
Circuits; Lithography; Photobleaching; Region 2; Resists; Semiconductor lasers; Shape; Solvents; Very large scale integration; Virtual manufacturing;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
