A Silicon-Added Bilayer Resist (SABRE) Process for High-Resolution Optical Lithography

Author

McColgin, W.C. ; Jech, J., Jr. ; Daly, R.C. ; Brust, T.B.

Author_Institution

Microelectronics Technology Division, Electronics Research Laboratories, Eastman Kodak Company, Rochester, New York 14650

fYear

1987

fDate

22-23 May 1987

Firstpage

Lastpage

Keywords

Etching; Floods; Lithography; Optical scattering; Optical sensors; Ovens; Planarization; Resists; Silicon; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1987. Digest of Technical Papers. Symposium on

Conference_Location

Karuizawa, Japan

Type

Filename

4480396

Link To Document