Title :
Field Isolation Process for Submicron CMOS
Author :
van der Plas, P.A. ; Snels, W.C.E. ; Stolmeijer, A. ; den Blanken, H.J. ; de Werdt, R.
Author_Institution :
Philips Research Laboratories P.O. BOX 80000. 5600 JA Eindhoven, The Netherlands
Keywords :
CMOS process; CMOS technology; Etching; Ion implantation; MOS devices; MOSFETs; Oxidation; Planarization; Programmable logic arrays; Topology;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
