DocumentCode :
472730
Title :
In-Situ MOS Gate Engineering in a Novel Rapid Thermal/Plasma Multiprocessing Reactor
Author :
Moslehi, Mehrdad M. ; Wong, Man ; Saraswat, Krishna C. ; Shatas, Steven C.
Author_Institution :
Center for Integrated Systems, Stanford University, Stanford, California 94305
fYear :
1987
fDate :
22-23 May 1987
Firstpage :
21
Lastpage :
22
Keywords :
Dielectrics and electrical insulation; Electromagnetic heating; Furnaces; Inductors; Plasma applications; Plasma materials processing; Plasma temperature; Rapid thermal processing; Thermal engineering; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
Type :
conf
Filename :
4480402
Link To Document :
بازگشت