DocumentCode
472733
Title
Photo Cleaning of Si Surface after Reactive Ion Etching
Author
Ikawa, E. ; Sugito, S. ; Aoto, N. ; Kurogi, Y.
Author_Institution
Microelectronics Research Laboratories, NEC Corporation 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 213, Japan
fYear
1987
fDate
22-23 May 1987
Firstpage
27
Lastpage
28
Keywords
Dry etching; Mercury (metals); Plasma applications; Semiconductor films; Substrates; Sulfur hexafluoride; Surface cleaning; Surface contamination; Surface morphology; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location
Karuizawa, Japan
Type
conf
Filename
4480405
Link To Document