• DocumentCode
    472763
  • Title

    Technology and Modeling of Submicron Contacts

  • Author

    Wright, P. ; Loh, W. ; Fu, C-C ; Dameron, D. ; Saraswat, K.

  • Author_Institution
    Department of Electrical Engineering 3 AEL, Stanford University, Stanford, CA 94305 USA
  • fYear
    1987
  • fDate
    22-23 May 1987
  • Firstpage
    87
  • Lastpage
    88
  • Keywords
    Boron; CMOS technology; Contact resistance; Dry etching; Electrical resistance measurement; Semiconductor device measurement; Semiconductor device modeling; Silicon; Testing; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. Digest of Technical Papers. Symposium on
  • Conference_Location
    Karuizawa, Japan
  • Type

    conf

  • Filename
    4480435
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472763