472766

Trench Capacitor Using R.T.O. for Mega Bit DRAM´s

Yoneda, K. ; Taniguchi, T. ; Uchida, H. ; Okada, H. ; Oishi, H. ; Miyai, Y. ; Inoue, M.

Kyoto Reserch Laboratory, Matsushita Electronics Corporation 19, Nishikujo-Kasugacho, Minami-ku, Kyoto 601 Japan

1987

22-23 May 1987

95

96

Capacitors; Compressive stress; Dielectric breakdown; Electric breakdown; Furnaces; Interface states; Oxidation; Random access memory; Temperature dependence; Thermal stresses;

English

ieee

VLSI Technology, 1987. Digest of Technical Papers. Symposium on

Karuizawa, Japan

conf

4480439