Deep UV Projection Lithography Using Novel Negative Resist

Author

Obayashi, H. ; Matsuzawa, T. ; Iwayanagi, T. ; Yanazawa, H. ; Nonogaki, S. ; Tomioka, H.

Author_Institution

Central Research Laboratory, Hitachi, Ltd., Higashi-koigakubo, Kokubunji, Tokyo, 185, Japan

fYear

1981

fDate

9-11 Sept. 1981

Firstpage

Lastpage

Keywords

Absorption; Aluminum; Laboratories; Lithography; Printing; Resins; Resists; Sputter etching; Surface topography; Throughput;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1981. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Type

Filename

4480498

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