DocumentCode

472776

Title

An Ideal Projection Photolithography

Author

Chang, M.S. ; Liu, E.D. ; Toole, M. M O

Author_Institution

Hewlett-Packard Laboratories Palo Alto, California 94304

fYear

1981

fDate

9-11 Sept. 1981

Firstpage

8

Lastpage

9

Keywords

Coatings; Etching; Lithography; Optical imaging; Plasma temperature; Polymers; Resists; Silicon; Substrates; Topology;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1981. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Type

conf

Filename

4480499