Title :
An Ideal Projection Photolithography
Author :
Chang, M.S. ; Liu, E.D. ; Toole, M. M O
Author_Institution :
Hewlett-Packard Laboratories Palo Alto, California 94304
Keywords :
Coatings; Etching; Lithography; Optical imaging; Plasma temperature; Polymers; Resists; Silicon; Substrates; Topology;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
