DocumentCode
472777
Title
The Evaluation of a Single-Step Lift-off Process Using the Method of Response Surface Analysis
Author
Hamel, C.J.
Author_Institution
IBM General Technology Division Essex Junction, Vermont 05452
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
10
Lastpage
11
Keywords
Fabrication; Metallization; Resists; Response surface methodology; Semiconductor films; Size measurement; Solvents; Technological innovation; Temperature sensors; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480500
Link To Document