Title :
An Ion Beam Exposure System for Mask Making
Author :
Yoshida, Kazue ; Kuwano, Hiroki ; Yamazaki, Shin-Ichi
Author_Institution :
Musashino Electrical Communication Lab., N.T.T. 3-9-11, Midoricho, Musashino-shi, Tokyo, Jpapn
Keywords :
Etching; Focusing; Ion beams; Lenses; Optical films; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sources; Resists;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
