DocumentCode :
472805
Title :
Dry Processes for Patterning
Author :
Abe, H. ; Yamazaki, T. ; Yoneda, M. ; Nishioka, K. ; Nakata, H.
Author_Institution :
LSI R&D Laboratory, Mitsubishi Electric Corporation 4-1, Mizuhara, Itami, Hyogo, 664 Japan
fYear :
1981
fDate :
9-11 Sept. 1981
Firstpage :
64
Lastpage :
65
Keywords :
Aluminum; Anisotropic magnetoresistance; Cleaning; Dry etching; Electron beams; Plasma applications; Resists; Silicon; Very large scale integration; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Type :
conf
Filename :
4480528
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472805
بازگشت