DocumentCode
472805
Title
Dry Processes for Patterning
Author
Abe, H. ; Yamazaki, T. ; Yoneda, M. ; Nishioka, K. ; Nakata, H.
Author_Institution
LSI R&D Laboratory, Mitsubishi Electric Corporation 4-1, Mizuhara, Itami, Hyogo, 664 Japan
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
64
Lastpage
65
Keywords
Aluminum; Anisotropic magnetoresistance; Cleaning; Dry etching; Electron beams; Plasma applications; Resists; Silicon; Very large scale integration; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480528
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