Title :
CVD Silicon Oxide below 100°c Utilizing Photochemical Combustion of SiH4 and O2
Author_Institution :
Carlsbad Research Center Hughes Aircraft Company Industrial Electronics Group Carlsbad, California, 92008
Keywords :
Chemical vapor deposition; Combustion; Etching; Hydrogen; Mercury (metals); Photochemistry; Plasma sources; Plasma temperature; Propellants; Silicon;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
