DocumentCode
472807
Title
CVD Silicon Oxide below 100°c Utilizing Photochemical Combustion of SiH4 and O2
Author
Sarkozy, R.F.
Author_Institution
Carlsbad Research Center Hughes Aircraft Company Industrial Electronics Group Carlsbad, California, 92008
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
68
Lastpage
69
Keywords
Chemical vapor deposition; Combustion; Etching; Hydrogen; Mercury (metals); Photochemistry; Plasma sources; Plasma temperature; Propellants; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480530
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