DocumentCode
472816
Title
A Complete Process/Device Simulation System and Its Application to the Design of Submicron MOSFETs
Author
Dang, R. ; Shibata, T. ; Konaka, M. ; Onga, S. ; Kashiwagi, M.
Author_Institution
Toshiba R & D Center, Toshiba Corporation 72 Horikawa-cho, Saiwai-ku, Kawasaki 210 Japan
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
86
Lastpage
87
Keywords
Analytical models; Circuit simulation; Circuit testing; Computational modeling; Computer simulation; Design optimization; Fabrication; Integrated circuit modeling; MOS devices; MOSFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480539
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