Title :
2D Process Modeling and Simulation for VLSI Design
Author :
Maldonado, C.D. ; Hall, W.F. ; Murphy, W.O. ; Louie, S.A.
Author_Institution :
Rockwell International Corporation Anaheim, CA
Keywords :
Boron; Boundary value problems; Fabrication; Geometry; Implants; Ion implantation; MOS devices; Process design; Solid modeling; Very large scale integration;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
