Two-Dimensional Process Modeling for High Density (LOCOS) Technology

Author

Dutton, Robert W. ; Mei, Len ; Chin, Daeje ; Kump, Mike

Author_Institution

Integrated Circuits Laboratory Stanford University Stanford, CA 94305

fYear

1981

fDate

9-11 Sept. 1981

Firstpage

Lastpage

Keywords

Analytical models; Boron; Etching; Impurities; Integrated circuit modeling; MOS devices; Oxidation; Plasma applications; Plasma simulation; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1981. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Type

Filename

4480541

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