DocumentCode
472820
Title
A New Transmission Line Model for Silicided Diffusions: Impact on the Performance of VLSI Circuits
Author
Scott, D.B. ; Hunter, W.R. ; Shichijo, H.
Author_Institution
Texas Instruments Incorporated Central Research Laboratories Dallas, Texas 75265
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
94
Lastpage
95
Keywords
Boron; Conductivity; Contact resistance; Distributed parameter circuits; Integrated circuit interconnections; MOS devices; Silicides; Transmission lines; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480543
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