Title :
The Use of Electron Beam Annealing to Reduce Contact Resistance for VLSI
Author :
Chen, John Y. ; Rensch, David B.
Author_Institution :
Hughes Research Laboratories Malibu, CA 90265
Keywords :
Annealing; CMOS technology; Conductivity; Contact resistance; Electron beams; Furnaces; Implants; Isothermal processes; Laser beams; Very large scale integration;
Conference_Titel :
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location :
Oiso, Japan
