DocumentCode :
472833
Title :
Perfect Planar Technology for VLSIs
Author :
Ehara, Kohei ; Morimoto, Takashi ; Muraumoto, Susumu ; Hosoya, Tetsuo ; Matsuo, Seitaro
Author_Institution :
Musashino Electrical Communication Laboratory, NTT Musashinoshi 3-9-11, Tokyo 180, Japan
fYear :
1982
fDate :
1-3 Sept. 1982
Firstpage :
30
Lastpage :
31
Keywords :
Cyclotrons; Etching; Fabrication; Large scale integration; Plasma applications; Plasma properties; Resists; Semiconductor devices; Substrates; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location :
Oiso, Japan
Type :
conf
Filename :
4480564
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472833
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