DocumentCode :
472845
Title :
Process-Device-Circuit CAD System for MOS VLSIs
Author :
Fukuma, M. ; Sakurai, M. ; Ohno, Y. ; Nishide, T. ; Okuto, Y.
Author_Institution :
Basic Technology Res. Labs. Nippon Electric Co., Ltd. 4-1-1 Miyazaki, Takatsu-ku, Kawasaki, Japan
fYear :
1982
fDate :
1-3 Sept. 1982
Firstpage :
56
Lastpage :
57
Keywords :
Analytical models; Circuit optimization; Circuit simulation; Curve fitting; Design automation; Differential equations; Fabrication; Impurities; MOSFETs; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location :
Oiso, Japan
Type :
conf
Filename :
4480576
Link To Document :
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