• DocumentCode
    472866
  • Title

    Modeling and Simulation of Hot Carrier Effects in MOSFETs

  • Author

    Wada, M. ; Shibata, T. ; Iizuka, H. ; Dang, R.L.M.

  • Author_Institution
    Toshiba R&D Center Toshiba Corporation, Kawasaki, Japan
  • fYear
    1982
  • fDate
    1-3 Sept. 1982
  • Firstpage
    102
  • Lastpage
    103
  • Keywords
    Circuit simulation; Degradation; Electrons; Hot carrier effects; Hot carriers; MOSFETs; Probability; Research and development; Threshold voltage; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1982. Digest of Technical Papers. Symposium on
  • Conference_Location
    Oiso, Japan
  • Type

    conf

  • Filename
    4480597