"Isolation Technique for VLSI"

fYear

1983

fDate

13-15 Sept. 1983

Firstpage

Lastpage

Keywords

Epitaxial growth; Insulation; Isolation technology; National electric code; Oxidation; Photochemistry; Substrates; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Print_ISBN

4-930813-05-0

Type

conf

Filename

4480623

Link To Document