Title :
CMOS Isolation Using Selective Epitaxial Regrowth
Author :
Jastrzebski, L. ; Ipri, A. ; Corboy, J. ; Metzl, R.
Author_Institution :
RCA Laboratories Princeton, NJ 08540
Keywords :
Boron; Dielectrics; Doping; Etching; MOS devices; Plasma applications; Plasma devices; Plasma properties; Silicon; Substrates;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
