Title :
A High Performance 16 Bit CPU Using Platinum-Silicide Gate
Author :
Okazawa, Takeshi ; Goto, Hideto ; Takemae, Koji
Author_Institution :
NEC Corporation Sagamihara, Kanagawa 229, Japan
Keywords :
Annealing; Electric resistance; Electrodes; Integrated circuit interconnections; Large scale integration; Leakage current; Silicidation; Silicides; Silicon; Temperature;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0