Title :
SUPREM III - Process Simulation Toward VLSI
Author :
Ho, C.P. ; Plummer, J.D. ; Hansen, S.E. ; Dutton, R.W.
Author_Institution :
Integrated Circuits Lab, Stanford University Stanford, CA 94305
Keywords :
Circuit simulation; Computational modeling; Epitaxial growth; Ion implantation; Oxidation; Predictive models; Semiconductor process modeling; Silicon; Substrates; Very large scale integration;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
