Title :
An Aerial Image Model with Applications to Contrast-Enhanced Lithography
Author :
Griffing, B.F. ; Lorensen, W.E.
Author_Institution :
General Electric Corporate Research and Development Center Schenectady, N. Y.
Keywords :
Application software; Bleaching; Computational modeling; Computer graphics; Image resolution; Lithography; Motion pictures; Optical filters; Photobleaching; Resists;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
