Submicron Optical Lithography Using a Double Layer Resist by a Single Development Technology

Author

Tsuji, K. ; Sasago, M. ; Kugimiya, K.

Author_Institution

Central Research Laboratory Matsushita Electric Industrial Company, Ltd. Moriguchi, Osaka 570, Japan

fYear

1983

fDate

13-15 Sept. 1983

Firstpage

Lastpage

Keywords

Coatings; Focusing; Image resolution; Laboratories; Lithography; Optical imaging; Planarization; Resists; Skin; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Print_ISBN

4-930813-05-0

Type

Filename

4480645

Link To Document