DocumentCode
472906
Title
Application of a New MRS-type Negative Resist MRL to 365 nm Reduction Exposure System
Author
Matsuzawa, Toshiharu ; Kishimoto, Akihiko ; Iwayanagi, Takao ; Yanazawa, Hiroshi ; Obayashi, Hidehito
Author_Institution
Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo, 185 Japan
fYear
1983
fDate
13-15 Sept. 1983
Firstpage
80
Lastpage
81
Keywords
Electromagnetic wave absorption; Etching; Image resolution; Laboratories; Lenses; Lighting control; Manufacturing; Optical reflection; Resins; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Print_ISBN
4-930813-05-0
Type
conf
Filename
4480646
Link To Document