Title :
Application of a New MRS-type Negative Resist MRL to 365 nm Reduction Exposure System
Author :
Matsuzawa, Toshiharu ; Kishimoto, Akihiko ; Iwayanagi, Takao ; Yanazawa, Hiroshi ; Obayashi, Hidehito
Author_Institution :
Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo, 185 Japan
Keywords :
Electromagnetic wave absorption; Etching; Image resolution; Laboratories; Lenses; Lighting control; Manufacturing; Optical reflection; Resins; Resists;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
