Title :
Plasma Etch in Via and Tri-Layer Resist
Author :
Lin, Jung ; O´toole, Michael M.
Author_Institution :
Hewlett-Packard Labs Palo Alto, California 94304
Keywords :
Anisotropic magnetoresistance; Dielectric substrates; Helium; Metallization; Optical films; Plasma applications; Reflection; Resists; Sputter etching; Sputtering;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
