DocumentCode
472908
Title
Computer Simulation of Electron Scattering by Heavy Atoms Added into Resist for Dry Etch Resistance Enhancement
Author
Hasegawa, S. ; Iida, Y.
Author_Institution
Microelectronics Research Laboratories, NEC Corporation 4-1-1, Miyazaki, Miyamae-ku, Kawasaki 213, Japan
fYear
1983
fDate
13-15 Sept. 1983
Firstpage
84
Lastpage
85
Keywords
Computer simulation; Dry etching; Electrons; Laboratories; Microelectronics; National electric code; Plasma simulation; Polymers; Resists; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Print_ISBN
4-930813-05-0
Type
conf
Filename
4480648
Link To Document