Title :
A Novel Tungsten Gate Technology for VLSI Applications
Author :
Kobayashi, Nobuyoshi ; Iwata, Seiichi ; Yamamoto, Naoki ; Terada, Tomoyuki
Author_Institution :
Central Research Lab., Hitachi Ltd. Kokubunji, Tokyo, Japan
Keywords :
Annealing; Chemical analysis; Coatings; Conductivity; Electrodes; Fabrication; Oxidation; Temperature; Tungsten; Very large scale integration;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
