• DocumentCode
    472936
  • Title

    Characterization of LPCVD Aluminun for VLSI Processing

  • Author

    Levy, R.A. ; Green, M.L.

  • Author_Institution
    AT&T Bell Laboratories Murray Hill, New Jersey 07974
  • fYear
    1984
  • fDate
    10-12 Sept. 1984
  • Firstpage
    32
  • Lastpage
    33
  • Keywords
    Aluminum; Conductivity; Contact resistance; Electrical resistance measurement; Grain size; Hydrogen; Optical films; Temperature; Thickness measurement; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1984. Digest of Technical Papers. Symposium on
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    4-930813-08-5
  • Type

    conf

  • Filename
    4480685
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472936