472936

Characterization of LPCVD Aluminun for VLSI Processing

Levy, R.A. ; Green, M.L.

AT&T Bell Laboratories Murray Hill, New Jersey 07974

1984

10-12 Sept. 1984

32

33

Aluminum; Conductivity; Contact resistance; Electrical resistance measurement; Grain size; Hydrogen; Optical films; Temperature; Thickness measurement; Very large scale integration;

English

ieee

VLSI Technology, 1984. Digest of Technical Papers. Symposium on

San Diego, CA, USA

4-930813-08-5

conf

4480685