DocumentCode

472953

Title

High Precision VLSI Patterning Technology for E-Beam Direct Writing Process

Author

Komatsu, Kazuhiko ; Suzuki, Masanori ; Harada, Katsuhiro

Author_Institution

Atsugi Electrical Communication Laboratory, NTT 1839, Ono, Atsugi-shi, Kanagawa, Japan

fYear

1984

fDate

10-12 Sept. 1984

Firstpage

66

Lastpage

67

Keywords

Compaction; Degradation; Laboratories; Lithography; Proximity effect; Random access memory; Resists; Shape; Very large scale integration; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1984. Digest of Technical Papers. Symposium on

Conference_Location

San Diego, CA, USA

Print_ISBN

4-930813-08-5

Type

conf

Filename

4480702