Title :
High Precision VLSI Patterning Technology for E-Beam Direct Writing Process
Author :
Komatsu, Kazuhiko ; Suzuki, Masanori ; Harada, Katsuhiro
Author_Institution :
Atsugi Electrical Communication Laboratory, NTT 1839, Ono, Atsugi-shi, Kanagawa, Japan
Keywords :
Compaction; Degradation; Laboratories; Lithography; Proximity effect; Random access memory; Resists; Shape; Very large scale integration; Writing;
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
4-930813-08-5
