DocumentCode
472961
Title
Hot Carrier Injection in Submicron MOSFETs Fabricated by Rapid Isothermal Annealing
Author
Mitsuhashi, J. ; Matsukawa, T. ; Sugimoto, K. ; Kawazu, S.
Author_Institution
LSI Research & Development Laboratory, Mitsubishi Electric Corporation 4-1 Mizuhara, Itami, Hyogo 664 Japan
fYear
1984
fDate
10-12 Sept. 1984
Firstpage
84
Lastpage
85
Keywords
Furnaces; Hot carrier injection; Interface states; Isothermal processes; Large scale integration; MOSFETs; Oxidation; Rapid thermal annealing; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location
San Diego, CA, USA
Print_ISBN
4-930813-08-5
Type
conf
Filename
4480711
Link To Document