Terahertz imaging with a 160x120 pixel microbolometer 90-fps camera

Author

Knyazev, B.A. ; Dem´yanenko, M.A. ; Esaev, D.G.

Author_Institution

Budker Inst. of Nucl. Phys. SB RAS, Russia & Novosibirsk State Univ., Novosibirsk

fYear

2007

fDate

2-9 Sept. 2007

Firstpage

360

Lastpage

361

Abstract

An uncooled micromolometer matrix camera has been developed for IR and THz high-speed imaging. The 120 x 160 matrix consists of resistive vanadium oxide elements on a silicon nitride bridge. The element size is 46 x 46 micron at the array period of 51 micron. We describe device fabrication process and matrix operational characteristics. Application of the camera in quasi-optical systems with Novosibirsk terahertz free electron laser as a radiation source is described. Recording rate up to 90 frames per second has been achieved.

Keywords

bolometers; free electron lasers; microwave photonics; submillimetre wave imaging; device fabrication; microbolometer matrix camera; picture size 120 pixel to 160 pixel; quasi-optical systems; radiation sources; size 46 micron; terahertz free electron laser; terahertz imaging; vanadium oxide elements; Amorphous silicon; Cameras; Chemical technology; Fabrication; Free electron lasers; Integrated circuit technology; Lighting; Optical imaging; Pixel; Thermoresistivity; Free electron laser; microbolometer matrix; terahertz imaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves, 2007 and the 2007 15th International Conference on Terahertz Electronics. IRMMW-THz. Joint 32nd International Conference on

Conference_Location

Cardiff

Print_ISBN

978-1-4244-1438-3

Type

conf

DOI

10.1109/ICIMW.2007.4516533

Filename

4516533